76042 氮化硅窗口.jpg
氮化硅TEM窗口在恶劣的实验室条件下表现良好，硅材料的框架100μm厚，适合标准的3mm支架和大多数双倾斜样品台，氮化硅窗口装在透明的凝胶盒中。
l 等离子可清洗-可以耐受强力等离子清洗，移去有机污染层
l 场到场的均匀性-整个薄膜厚度的变化小于0.5 nm
l 可容忍1000°C以上的温度-支持在高温下观察动态过程中使用
l 经得起严酷的条件-提供理想的成像分辨率、化学稳定性和机械强度
l 氮化硅采用LPCVD法制造，具有平坦，绝缘和疏水表面
选择参考
High Resolution Imaging: 5nm 76042-43, 1 square (25x25μm)
76042-44, 9 squares (50x50μm)
76042-45, 2 slots (50x1500μm)*
Robust, Increased High Resolution: 10nm 76042-46, 9 squares (100x100μm)
Everyday Imaging: 20nm 76042-49, 1 square (500x500μm)
76042-50, 9 squares (100x100μm)
Demanding Conditions: 50nm 76042-53, 1 square (100x100μm)
76042-52, 1 square (500x500μm)
76042-51, 1 square (1000x1000μm)
76042-50, 9 squares (100x100μm)
Materials & Cryo-EM Suspension: Microporous 76042-41, 1 square (500x500μm)
76042-40, 1 square (500x500μm)
产品选购：
货号 产品描述 窗口尺寸 SiN厚度 规格
76042-40 Silicon Nitride Microporous TEM Window Grid (2.0 μm pores with labeled grid) 500μm sq. 20nm 10/pk
76042-41 Silicon Nitride Microporous TEM Window Grid (2.0 μm pores with labeled grid) 500μm sq. 50nm 10/pk
76042-42 Silicon Nitride Nanoporous TEM Window Grid 500μm sq. 20nm 10/pk
76042-43 Silicon Nitride TEM Window Grid 25μm sq. 5nm 10/pk
76042-44 Silicon Nitride TEM Window Grid (8) 50μm sq., 5nm 10/pk
76042-45 Silicon Nitride TEM Window Grid (1) 50x100μm 5nm 10/pk
76042-46 Silicon Nitride TEM Window Grid (2) 50x1500μm 10nm 10/pk
76042-47 Silicon Nitride TEM Window Grid (8) 100 sq., 10nm 10/pk
76042-48 Silicon Nitride TEM Window Grid (1) 100x350μm 20nm 10/pk
76042-49 Silicon Nitride TEM Window Grid (8) 250 sq., 20nm 10/pk
76042-50 Silicon Nitride TEM Window Grid (1) 250x500μm 50nm 10/pk
76042-51 Silicon Nitride TEM Window Grid (8) 100 sq., 50nm 10/pk
76042-52 Silicon Nitride TEM Window Grid (1) 100x350μm 50nm 10/pk
76042-53 Silicon Nitride TEM Window Grid 500μm sq. 50nm 10/pk
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